Title: Diameter-dependent boron diffusion in silicon nanowire-based transistors
Authors: Schulze, Andreas
Florakis, Antonios
Hantschel, Thomas
Eyben, Pierre
Verhulst, Anne
Rooyackers, Rita
Vandooren, Anne
Vandervorst, Wilfried
Issue Date: 2013
Publisher: American Institute of Physics
Series Title: Applied Physics Letters vol:102 issue:5 pages:52108
ISSN: 0003-6951
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section

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