Title: Mask effects on resist variability in extreme ultraviolet lithography
Authors: Vaglio Pret, Alessandro
Gronheid, Roel
Engelen, Jan
Yan, Pei-Yang
Leeson, Michael
Younkin, Todd
Garidis, Kostas
Biafore, John
Issue Date: 2013
Publisher: Publication Board, Japanese Journal of Applied Physics
Series Title: Japanese Journal of Applied Physics 1, Regular Papers, Short Notes & Review Papers vol:52 issue:6 pages:03GC02
ISSN: 0021-4922
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology

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