|ITEM METADATA RECORD
|Title: ||Mask effects on resist variability in extreme ultraviolet lithography|
|Authors: ||Vaglio Pret, Alessandro|
|Issue Date: ||2013 |
|Publisher: ||Publication Board, Japanese Journal of Applied Physics|
|Series Title: ||Japanese Journal of Applied Physics 1, Regular Papers, Short Notes & Review Papers vol:52 issue:6 pages:03GC02|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Supporting Services Campusmanagement Science, Engineering and Technology|
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