Title: Wafer Level Characterization of the Sacrificial HDP Oxide Lateral Etching by Anhydrous Vapor HF with Ethanol Vapor for SiGe MEMS Structures
Authors: Cui, H ×
Van Hoof, R
Severi, S
Witvrouw, Ann
Knoops, A
Delande, T
Pancken, J
Claes, M #
Issue Date: 2010
Publisher: Electrochemical Society, Inc
Host Document: ECS Transactions vol:33 issue:8 pages:295-307
Conference: Symposium on Chemical Sensors 9 - Chemical and Biological Sensors and Analytical Systems / Symposium on Microfabricated and Nanofabricated Systems for MEMS/NEMS 9 held during the 218th Meeting of the Electrochemical-Society (ECS) location:Las Vegas, USA date:Oct 10-15, 2010
ISBN: 978-1-60768-177-9
ISSN: 1938-5862
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Non-KU Leuven Association publications
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science