Title: A comparison between wet HF etching and vapor HF etching for sacrificial oxide removal
Authors: Witvrouw, Ann ×
Du Bois, B
De Moor, P
Verbist, A
Van Hoof, Chris
Bender, H
Baert, Kris #
Issue Date: 2000
Publisher: SPIE-Int Soc Optical Engineering
Host Document: Proc. SPIE - Micromachining and Microfabrication Process Technology VI vol:4174 pages:130-141
Conference: Conference on Micromachining and Microfabrication Process Technology VI location:Santa Clara, USA date:Sept 18-19, 2000
ISBN: 0-8194-3830-8
ISSN: 0277-786X
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Non-KU Leuven Association publications
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science