Title: Photoresist coating and patterning for through-silicon via technology
Authors: Pham, N. P ×
Tezcan, D. S
Ruythooren, W
De Moor, P
Majeed, B
Baert, Kasper
Swinnen, B #
Issue Date: 2008
Publisher: IOP Publishing Ltd.
Series Title: Journal of Micromechanics and Microengineering vol:18 issue:12 pages:00-00
ISSN: 0960-1317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science