Title: Process dependent N/PBTI characteristics of TiN gate FinFETs
Authors: Kim, Jin Ju
Cho, Moon Ju
Pantisano, Luigi
Chiarella, Thomas
Togo, Mitsuhiro
Horiguchi, Naoto
Groeseneken, Guido
Lee, Byoung Hun
Issue Date: 2012
Publisher: Institute of Electrical and Electronics Engineers
Series Title: IEEE Electron Device Letters vol:33 issue:7 pages:937-939
ISSN: 0741-3106
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science