Title: Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates
Authors: Delabie, Annelies ×
Sioncke, Sonja
Rip, Jens
Van Elshocht, Sven
Pourtois, Geoffrey
Mueller, Matthias
Beckhoff, Burkhard
Pierloot, Kristine #
Issue Date: Jan-2012
Publisher: Published by AVS through the American Institute of Physics
Series Title: Journal of Vacuum Science & Technology A, Vacuum, Surfaces and Films vol:30 issue:1 pages:01A127
ISSN: 0734-2101
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Quantum Chemistry and Physical Chemistry Section
× corresponding author
# (joint) last author

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