Title: Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch
Authors: Winroth, Gustaf
Gronheid, Roel
Kim, Tae-Gon
Mertens, Paul
Issue Date: 2012
Publisher: North-Holland
Series Title: Microelectronic Engineering vol:98 pages:159-162
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications

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