|ITEM METADATA RECORD
|Title: ||Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch|
|Authors: ||Winroth, Gustaf|
|Issue Date: ||2012 |
|Series Title: ||Microelectronic Engineering vol:98 pages:159-162|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Non-KU Leuven Association publications|
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