|ITEM METADATA RECORD
|Title: ||Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer|
|Authors: ||Kuppuswamy, Vijaya-Kumar Murugesan|
Vaglio Pret, Alessandro
|Issue Date: ||2012 |
|Host Document: ||Extreme Ultraviolet (EUV) Lithography III pages:832207|
|Conference: ||Extreme Ultraviolet (EUV) Lithography III location:San Jose, CA USA date:12/02/2012|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Supporting Services Campusmanagement Science, Engineering and Technology|
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