Title: Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer
Authors: Kuppuswamy, Vijaya-Kumar Murugesan
Constantoudis, Vassilios
Gogolides, Evangelos
Vaglio Pret, Alessandro
Gronheid, Roel
Issue Date: 2012
Host Document: Extreme Ultraviolet (EUV) Lithography III pages:832207
Conference: Extreme Ultraviolet (EUV) Lithography III location:San Jose, CA USA date:12/02/2012
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Supporting Services Campusmanagement Science, Engineering and Technology

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