|ITEM METADATA RECORD
|Title: ||Impact of EUV mask surface roughness on LER|
|Authors: ||Vaglio Pret, Alessandro|
Leeson, Michael J
|Issue Date: ||2012 |
|Host Document: ||Extreme Ultraviolet (EUV) Lithography III pages:83220N|
|Conference: ||Extreme Ultraviolet (EUV) Lithography III location:San jose, CA USA date:12/02/2012|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Supporting Services Campusmanagement Science, Engineering and Technology|
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