Title: Impact of EUV mask surface roughness on LER
Authors: Vaglio Pret, Alessandro
Gronheid, Roel
Younkin, Todd
Leeson, Michael J
Yan, Pei-Yang
Issue Date: 2012
Host Document: Extreme Ultraviolet (EUV) Lithography III pages:83220N
Conference: Extreme Ultraviolet (EUV) Lithography III location:San jose, CA USA date:12/02/2012
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems

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