ITEM METADATA RECORD
Title: Dip-Pen Nanolithography-Generated Patterns Used as Gold Etch Resists: A Comparison Study of 16-Mercaptohexadecanioc Acid and 1-Octadecanethiol
Authors: Lu, Gang
Chen, Yanhong
Li, Bing
Zhou, Xiaozhu
Xue, Can
Ma, Jan
Boey, Freddy Y. C
Zhang, Hua # ×
Issue Date: 2009
Publisher: American Chemical Society
Series Title: Journal of Physical Chemistry C vol:113 issue:10 pages:4184-4187
ISSN: 1932-7447
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications
× corresponding author
# (joint) last author

Files in This Item:
File Description Status SizeFormat
jp810746j.pdf Published 256KbAdobe PDFView/Open Request a copy

These files are only available to some KU Leuven Association staff members

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science