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Title: Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O-3: growth behaviour and film characteristics
Authors: Han, Jeong Hwan ×
Ungur, Elisaveta
Franquet, Alexis
Opsomer, Karl
Conard, Thierry
Moussa, Alain
De Gendt, Stefan
Van Elshocht, Sven
Adelmann, Christoph #
Issue Date: 2013
Publisher: R S C Publications
Series Title: Journal of Materials Chemistry C vol:1 issue:37 pages:5981-5989
ISSN: 2050-7526
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
× corresponding author
# (joint) last author

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