The role of hot electron refluxing in laser-generated K-alpha sources
Neumayer, P × Aurand, B Basko, M Ecker, B Gibbon, Paul Hochhaus, D. C Karmakar, A Kazakov, E Kuehl, T Labaune, C Rosmej, O Tauschwitz, An Zielbauer, B Zimmer, D #
American Institute of Physics
Physics of Plasmas vol:17 issue:10
A study of the contribution of refluxing electrons in the production of K-alpha radiation from high-intensity laser irradiated thin targets has been performed. Thin copper foils both freestanding, and backed by a thick substrate were irradiated with laser pulses of energies around 100 J at intensities ranging from below 10(17) to above 10(19) W/cm(2). At high laser intensities we find a strong reduction in the K-alpha yield from targets backed by the substrate. The observed yield reduction is in good agreement with a simple model using hot electron spectra from particle-in-cell simulations or directly inferred from the measured bremsstrahlung emission and can therefore be interpreted as due to the suppression of hot electron refluxing. The study shows that refluxing electrons play a dominant role in high-intensity laser driven K-alpha generation and have to be taken into account in designing targets for laser driven high-flux K-alpha sources.