Title: SLM device for 193 nm lithographic applications
Authors: Lauria, John ×
Albright, Ronald
Vladimirsky, Olga
Hoeks, Maarten
Vanneer, Roel
van Drieenhuizen, Bert
Chen, Luoqi
Haspeslagh, Luc
Witvrouw, Ann
Issue Date: 2009
Publisher: North-Holland
Series Title: Microelectronic Engineering vol:86 issue:4-6 pages:569-572
Conference: 34th International Conference on Micro- and Nano-Engineering location:Athens: GREECE date:SEP 15-18, 2008
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications
× corresponding author

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