Title: Fabrication and characterization of functionally graded Ni-Ti multilayer thin films
Authors: Tian, H. # ×
Schryvers, D. #
Mohanchandra, K.P. #
Carman, G.P. #
Van Humbeeck, Jan #
Issue Date: 2009
Publisher: World Scientific Publishing Co. Pte. Ltd.
Series Title: Functional Materials Letters vol:2 issue:2 pages:61-66
Abstract: A functionally graded multilayer Ni–Ti thin film was deposited on a SiO2/Si substrate by d.c. sputtering using a ramped heated Ni–Ti alloy target. The stand-alone films were crystallized at 500◦C in vacuum better than 10−7 Torr. Transmission electron microscopy micrographs taken along the film cross section show two distinct regions, thin and thick, with weak R and B2 phases, respectively. The film compositions along the thickness were measured and quantified using the standard-less EELSMODEL method. The film deposited during the initial thermal ramp (thin regions) displays an average of 54 at.% Ni while the film deposited at a more elevated target temperature (thick regions) shows about 51 at.% Ni.
ISSN: 1793-6047
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Surface and Interface Engineered Materials
× corresponding author
# (joint) last author

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