Title: On the process and material sensitivities for high-k based dielectrics
Authors: Van Elshocht, S
Adelmann, C
Popovici, M
Swerts, J
Delabie, A
Nyns, L
Shi, X
Tielens, H
Pourtois, G
Menou, N
Breuil, L
Pierreux, D
Maes, J. W
Hardy, Adrien
Van Bael, M. K
Jurczak, M
Kittl, J. A #
Issue Date: 2010
Host Document: CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2010 (CSTIC 2010) vol:27 issue:1 pages:693-698
Conference: 9th China Semiconductor Technology International Conference (CSTIC) location:Shanghai: PEOPLES R CHINA date:MAR 18-19, 2010
ISBN: 978-1-60768-156-4
ISSN: 1938-5862
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Quantum Chemistry and Physical Chemistry Section
# (joint) last author

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