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Title: Development of ALD HfZrOx with TDEAH, TDEAZ and H2O
Authors: Shi, X
Tielens, H
Takeoka, S
Nakabayashi, T
Nyns, L
Adelmann, C
Delabie, A
Schram, T
Ragnarsson, L
Schaekers, M
Date, L
Schreutelkamp, R
Van Elshocht, S #
Issue Date: 2010
Publisher: ELECTROCHEMICAL SOC INC
Host Document: CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2010 (CSTIC 2010) vol:27 issue:1 pages:699-704
Conference: 9th China Semiconductor Technology International Conference (CSTIC) location:Shanghai: PEOPLES R CHINA date:MAR 18-19, 2010
ISBN: 978-1-60768-156-4
ISSN: 1938-5862
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Quantum Chemistry and Physical Chemistry Section
# (joint) last author

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