ITEM METADATA RECORD
Title: Study of the etching mechanism of heavily doped Si in HF
Authors: Valckx, Nick
Cuypers, Daniel
Vos, Rita
Philipsen, Harold
Rip, Jens
Doumen, Geert
Mertens, Paul
Heyns, Marc
De Gendt, Stefan #
Issue Date: 2012
Publisher: TRANS TECH PUBLICATIONS LTD
Host Document: ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES X vol:187 pages:41-44
Conference: 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2010) location:Ostend: BELGIUM date:SEP 20-22, 2010
ISBN: *****************
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Molecular Design and Synthesis
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science