ITEM METADATA RECORD
Title: Manufacturable processes for <= 32-nm-node CMOS enhancement by synchronous optimization. of strain-engineered channel and external parasitic resistances
Authors: Noori, Atif M ×
Balseanu, Mihaela
Boelen, Pieter
Cockburn, Andrew
Demuynck, Steven
Felch, Susan
Gandikota, Srinivas
Gelatos, A. Jerry
Khandelwal, Amit
Kittl, Jorge
Lauwers, Anne
Lee, Wen-Chin
Lei, Jianxin
Mandrekar, Tushar
Schreutelkamp, Robert
Shah, Kavita
Thompson, Scott E
Verheyen, Peter
Wang, Ching-Ya
Xia, Li-Qun
Arghavani, Reza #
Issue Date: May-2008
Publisher: Institute of Electrical and Electronics Engineers
Series Title: IEEE Transactions on Electron Devices vol:55 issue:5 pages:1259-1264
ISSN: 0018-9383
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science