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Title: Transient and end silicide phase formation in thin film Ni/polycrystalline-Si reactions for fully silicided gate applications
Authors: Kittl, Jorge ×
Pawlak, M. A
Torregiani, Cristina
Lauwers, Annick
Demeurisse, C
Vrancken, C
Absil, P. P
Biesemans, S
Coia, C
Detavernier, C
Jordan-Sweet, J
Lavoie, C #
Issue Date: 2007
Publisher: American Institute of Physics
Series Title: Applied Physics Letters vol:91 issue:17
Article number: ARTN 172108
ISSN: 0003-6951
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications
× corresponding author
# (joint) last author

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