Title: Self-aligned Ti and Co silicides for high performance sub-0.18 mu m CMOS technologies
Authors: Kittl, Jorge ×
Hong, QZ #
Issue Date: 1998
Publisher: Elsevier Sequoia
Series Title: Thin Solid Films vol:320 issue:1 pages:110-121
ISSN: 0040-6090
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications
× corresponding author
# (joint) last author

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