Title: Electrochemical deposition: a method for the production of artificially structured materials
Authors: Haseeb, Abdul
Blanpain, Bart
Wouters, Geert
Celis, Jean-Pierre
Roos, Jef #
Issue Date: 31-Aug-1993
Publisher: Elsevier Science SA Lausanne
Host Document: Materials Science and Engineering A, Structural Materials: Properties, Microstructure and Processing vol:168 issue:2 pages:137-140
Conference: Symposium on Nanophase Materials, at the EMRS 1992 Fall Meeting of the European-Materials-Research-Society location:Strasbourg, France date:03-06 November 1992
Abstract: The potential of electrochemical deposition (ECD) as a production method for artificially structured materials is discussed. Compared with physical vapour deposition (PVD), ECD technology has some definite advantages. Its low cost, industrial applicability and its ability to produce structural features with sizes ranging from nanometres to micrometres have recently created increased interest in this technology for the production of artificially structured materials. The different ECD methods are briefly reviewed and some specific cases of artificially structured coatings produced by ECD, such as epitaxial multilayered material (Cu/Ni), amorphous material in combination with crystalline material (NiP(x)/NiP(y)) and alternating hard and ductile materials (NiP(x)/Sn), will be highlighted. It will be shown that, by controlling the ECD conditions adequately, a wide range of artificially structured materials with respect to their constituent elements and their microstructural morphology may be produced.
ISSN: 0921-5093
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Surface and Interface Engineered Materials
Sustainable Metals Processing and Recycling
# (joint) last author

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