Title: Atomic Layer Deposition of Tantalum Oxide and Tantalum Silicate from Chloride Precursors
Authors: Adelmann, Christoph ×
Delabie, Annelies
Schepers, Bart
Rodriguez, Leonard N. J.
Franquet, Alexis
Conard, Thierry
Opsomer, Karl
Vaesen, Inge
Moussa, Alain
Pourtois, Geoffrey
Pierloot, Kristine
Caymax, Matty
Van Elshocht, Sven #
Issue Date: Sep-2012
Publisher: Verlag GmbH & Co. KGaA
Series Title: Chemical Vapor Deposition vol:18 pages:225-238
ISSN: 0948-1907
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Quantum Chemistry and Physical Chemistry Section
× corresponding author
# (joint) last author

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