Title: Anisotropic Atomic Layer Deposition Profiles of TiO2 in Hierarchical Silica Material with Multiple Porosity
Authors: Sree, Sreeprasanth Pulinthanathu ×
Dendooven, Jolien
Jammaer, Jasper
Masschaele, Kasper
Deduytsche, Davy
D'Haen, Jan
Kirschhock, Christine
Martens, Johan
Detavernier, Christophe #
Issue Date: Jul-2012
Publisher: American Chemical Society
Series Title: Chemistry of Materials vol:24 issue:14 pages:2775-2780
Abstract: Anisotropic deposition profiles of TiO2 in Zeotile-4 ordered mesoporous silica material are obtained using Atomic Layer Deposition (ALD) involving alternating pulses of tetrakis(dimethylamino) titanium (TDMAT) and water. TiO2 concentration profiles visualized by transmission electron microscopy (TEM) on particle cross sections reveal the systematic deeper penetration of the deposition front along the main channels and the more limited penetration in the perpendicular direction through the narrower slit-like mesopores. In ordered mesoporous material with one-dimensional pore system ALD leads to pore plugging. Diffusion limited ALD is shown to be useful for TiO2 deposition in anisotropic mesoporous support materials.
ISSN: 0897-4756
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Centre for Surface Chemistry and Catalysis
× corresponding author
# (joint) last author

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