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Title: Adsorbable organic halogen compounds arise and dissipate during treatment of wastewater by oxidation techniques
Authors: Sniegowski, Kristel
Gielen, Bjorn
Tormans, Marijn
Braeken, Leen
Van de Moortel, Wim
Luyten, Jan #
Issue Date: 2012
Publisher: IWA
Series Title: Proceedings of the 6th IWA Conference on Oxidation Technologies for Water and Wastewater Treatment (on cd-rom)
Conference: IWA Conference on Oxidation Technologies for Water and Wastewater Treatment edition:6 location:Goslar, Germany date:7-9 May 2012
Abstract: Advanced chemical oxidation processes give promising results in order to meet the restricted governmental regulations regarding hazardous compounds in industrial wastewater. However, recent studies indicate compromising results since adsorbable halogen organic compounds increase rather than decrease due to the presence of high concentrations of halogen ions during the oxidation reactions. This might jeopardize the applicability of this innovative technique in the industry. Lab scale experiments with aqueous solutions containing either phenol or hexanol and 1000 mg L-1 of chloride indeed show that AOX concentrations can increase until 300 µg Cl- L-1 during chemical oxidation. Maximum concentrations depend greatly on the pH, chloride concentration, type of oxidant and oxidant dosage. Therefore the applicability of AOPs in waste water with elevated concentrations of halogen ions need to be controlled to achieve the environmental standards.
URI: 
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Faculteit Industrieel Ingenieur - KHLim
Surface and Interface Engineered Materials
Technologiecluster Processing Industrie - TM M
Chemical and Biochemical Process Technology and Control Section
Chemical Engineering - miscellaneous
Process Engineering for Sustainable Systems Section
Sustainable Metals Processing and Recycling
# (joint) last author

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