Title: Deposition and characterization of MgO/Si gate stacks grown by molecular beam epitaxy
Authors: Su, Chen-Yi ×
Frederickx, Michiel
Menghini, Mariela Andrea
Dillemans, Leander
Lieten, Ruben
Smets, Tomas
Seo, Jin Won
Locquet, Jean-Pierre #
Issue Date: May-2012
Publisher: Elsevier Sequoia
Series Title: Thin Solid Films vol:520 issue:14 pages:4508-4511
Abstract: In this article, the deposition and characterization of amorphous MgO films grown on Si (001) using molecular beam epitaxy is reported. In order to ensure amorphous films, low substrate temperatures (200 degrees C) and high oxygen pressures were used (up to 5 x 10(-3) Pa). Both atomic and molecular oxygen species were used at different pressures. Films ranging in thickness from 3 nm till 30 nm were grown and characterized using structural and electrical methods.
ISSN: 0040-6090
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Solid State Physics and Magnetism Section
× corresponding author
# (joint) last author

Files in This Item:
File Description Status SizeFormat
Su Thin Solid Films 2012 Deposition and characterization of MgO:Si gate stacks grown by molecular beam epitaxy.pdf Published 692KbAdobe PDFView/Open Request a copy

These files are only available to some KU Leuven Association staff members


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science