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Title: Direct-on-barrier copper electroplating on ruthenium from the ionic liquid 1-ethyl-3-methylimidazolium dicyanamide
Authors: D'Urzo, Lucia ×
Schaltin, Stijn
Shkurankov, Andrey
Plank, Harald
Kothleitner, Gerald
Gspan, Christian
Binnemans, Koen
Fransaer, Jan #
Issue Date: Apr-2012
Publisher: Chapman and Hall
Series Title: Journal of Materials Science. Materials in Electronics vol:23 issue:4 pages:945-951
Abstract: The "direct-on-barrier" electroplating of copper on ruthenium from a 1 mol dm(-3) solution of CuCl in the ionic liquid 1-ethyl-3-methylimidazolium dicyanamide, [C(2)mim][N(CN)(2)], is reported. Continuous layers of copper with a preferential Cu(111) orientation were obtained from this electrolyte. The copper coatings were investigated by top view scanning electron microscopy (SEM), X-ray diffraction (XRD), and focused ion beam transmission electron microscopy (FIB-TEM). The nucleation density was both theoretically and experimentally evaluated by the Scharifker-Hills model and transmission electron microscopy, respectively. The direct plating of copper on resistive substrates for advanced interconnects and package is a promising new application of ionic liquids.
ISSN: 0957-4522
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Surface and Interface Engineered Materials
× corresponding author
# (joint) last author

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