ITEM METADATA RECORD
Title: In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetry
Authors: Dendooven, Jolien ×
Devloo-Casier, Kilian
Levrau, Elisabeth
Van Hove, Robbert
Pulinthanathu Sree, Sreeprasanth
Baklanov, Mikhail R
Martens, Johan
Detavernier, Christophe #
Issue Date: Feb-2012
Publisher: American Chemical Society
Series Title: Langmuir vol:28 issue:8 pages:3852-3859
Abstract: Ellipsometric porosimetry (EP) is a handy technique to characterize the porosity and pore size distribution of porous thin films with pore diameters in the range from below 1 nm up to 50 nm and for the characterization of porous low-k films especially. Atomic layer deposition (ALD) can be used to functionalize porous films and membranes, e.g., for the development of filtration and sensor devices and catalytic surfaces. In this work we report on the implementation of the EP technique onto an ALD reactor. This combination allowed us to employ EP for monitoring the modification of a porous thin film through ALD without removing the sample from the deposition setup. The potential of in situ EP for providing information about the effect of ALD coating on the accessible porosity, the pore radius distribution, the thickness, and mechanical properties of a porous film is demonstrated in the ALD of TiO2 in a mesoporous silica film.
ISSN: 0743-7463
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Centre for Surface Chemistry and Catalysis
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science