Title: Second-harmonic generation reveals the oxidation steps in semiconductor processing
Authors: Vanbel, Maarten ×
Valev, Ventsislav
Vincent, B
Afanas'ev, Valeri
Locquet, J-P
Van Elshocht, S
Caymax, M
Verbiest, Thierry #
Issue Date: Mar-2012
Publisher: American Institute of Physics
Series Title: Journal of Applied Physics vol:111 issue:6 pages:-
Article number: 064504
Abstract: Monitoring oxidation steps is an important factor during the fabrication of semiconductor devices, because transistor performance can be greatly affected by defects in the passivation layer. As an example, we discuss the formation of a gate stack in metal oxide semiconductor (MOS) devices using Ge as an alternative channel material. Building an MOS gate stack on Ge requires passivation of the interface between the dielectric (typically a high-k material such as Al2O3 or HfO2, grown by means of atomic layer deposition (ALD)) and the Ge channel. Such passivation can be obtained from a very thin Si layer, epitaxially grown on Ge. The Si surface receives an oxidizing clean (O-3 or wet chemical clean) before the ALD step. In this work, second-harmonic generation (SHG) data are presented for silicon layers with varying thickness, grown with either trisilane (Si3H8) or silane (SiH4) and with various cleaning steps. The trend in second-harmonic response upon azimuthal rotation of the samples was comparable for both silane and trisilane as a Si precursor. Our results show that upon oxidation, the SHG intensity reduces, most likely due to a reduction of the amount of crystalline Si, which is converted to SiO2. (C) 2012 American Institute of Physics. []
ISSN: 0021-8979
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Imaging and Photonics
Semiconductor Physics Section
× corresponding author
# (joint) last author

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