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|ITEM METADATA RECORD
|Title: ||Selective wet removal of Hf-based layers and post-dry etch residues in high-k and metal gate stacks|
|Authors: ||Claes, M ×|
De Gendt, Stefan #
|Issue Date: ||Jan-2005 |
|Publisher: ||Trans tech publications ltd|
|Series Title: ||Ultra clean processing of silicon surfaces vii vol:103-104 pages:93-96|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Department of Materials Engineering - miscellaneous|
Molecular Design and Synthesis
× corresponding author|
# (joint) last author|
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