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Title: Selective wet removal of Hf-based layers and post-dry etch residues in high-k and metal gate stacks
Authors: Claes, M ×
Paraschiv, V
Beckx, S
Demand, M
Deweerd, W
Garaud, Sylvain
Kraus, H
Vos, R
Snow, J
Boullart, W
De Gendt, Stefan #
Issue Date: Jan-2005
Publisher: Trans tech publications ltd
Series Title: Ultra clean processing of silicon surfaces vii vol:103-104 pages:93-96
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Department of Materials Engineering - miscellaneous
Molecular Design and Synthesis
× corresponding author
# (joint) last author

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