Title: HF based solutions for HfO2 removal; Effect of pH and temperature on HfO2 : SiO2 etch selectivity
Authors: Paraschiv, V ×
Claes, M
Baklanov, MR
Boullart, W
De Gendt, Stefan
Vanhaelemeersch, S #
Issue Date: Jan-2005
Publisher: Trans tech publications ltd
Series Title: Ultra clean processing of silicon surfaces vii vol:103-104 pages:97-101
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science