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Title: Wafer backside cleaning strategies for high-k/metal gate processing
Authors: Vos, R
Kesters, E
Garaud, Sylvain
De Waele, Rita
Kenis, K
Lux, M
Kraus, H
Snow, J
Shamiryan, D
Catana, G
Deweerd, W
Schram, T
De Gendt, Stefan
Mertens, P #
Issue Date: Jan-2005
Publisher: Trans tech publications ltd
Series Title: Ultra clean processing of silicon surfaces vii vol:103-104 pages:241-244
Abstract: In this work the removal of different metallic and particulate contaminants relevant for high-k/metal gate processing is studied. Best cleaning efficiency of both silicon and nitride substrates is achieved using a HF/HNO3-based cleaning resulting in a particle removal efficiency higher than 90% and metal removal down to 10(10) at/cm(2).
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Department of Materials Engineering - miscellaneous
Molecular Design and Synthesis
# (joint) last author

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