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Title: XPS study of the cleaning efficiency by ozone processes of the protective films formed by reactive ion etching of Co and Ti silicide
Authors: Conard, T. ×
De Gendt, Stefan
Baklanov, Mikhail
Vos, R.
Heyns, Marc
Vandervorst, Wilfried #
Issue Date: Jan-1999
Publisher: Trans tech-scitec publications ltd
Series Title: Solid state phenomena vol:65-6 pages:139-142
Abstract: The formation of the protective film on CoSi2 and TiSi2 following dry etching with CF4/CHF3 plasma and their removal are presented here. We concentrate here on the removal of this protective film using ozone chemistry and on a general comparison between different ozone and sulfuric (SPM, SOM) based cleaning.
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Molecular Design and Synthesis
Department of Materials Engineering - miscellaneous
× corresponding author
# (joint) last author

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