Title: Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result
Authors: Foubert, Philippe ×
Vaglio Pret, Alessandro
Altamirano Sanchez, Efrain
Gronheid, Roel #
Issue Date: Jul-2011
Publisher: SPIE
Series Title: Journal of Micro/Nanolithography MEMS and MOEMS vol:10 issue:3 pages:33001
ISSN: 1537-1646
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science