|ITEM METADATA RECORD
|Title: ||Optimization of resist ash processes on Si045Ge055 substrates for post extension-halo ion implantation|
|Authors: ||Mannaert, Geert|
Altamirano Sanchez, Efrain
|Issue Date: ||2011 |
|Host Document: ||ULSI Process Integration 7 vol:41 issue:7 pages:283-291|
|Conference: ||7th Symposium on ULSI Process Integration at the 220th Meeting of the Electrochemical-Society (ECS) location:Boston, MA USA date:04-19 October 2011|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Non-KU Leuven Association publications|
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