Title: Optimization of resist ash processes on Si045Ge055 substrates for post extension-halo ion implantation
Authors: Mannaert, Geert
Vos, Rita
Tsvetanova, Diana
Altamirano Sanchez, Efrain
Witters, Liesbeth
Demand, Marc
Sonnemans, R
Berry, I
Issue Date: 2011
Host Document: ULSI Process Integration 7 vol:41 issue:7 pages:283-291
Conference: 7th Symposium on ULSI Process Integration at the 220th Meeting of the Electrochemical-Society (ECS) location:Boston, MA USA date:04-19 October 2011
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Non-KU Leuven Association publications

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