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Title: Relation between particle density and haze on a wafer: A new approach to measuring nano-sized particles
Authors: Xu, Kaidong ×
Vos, R
Vereecke, G
Lux, M
Fyen, Wim
Holsteyns, F
Kenis, K
Mertens, PW
Heyns, MM
Vinckier, Christiaan #
Issue Date: Jan-2003
Publisher: Trans tech publications ltd
Series Title: Ultra clean processing of silicon surfaces v vol:92 pages:161-164
Abstract: The deposition of the nano-sized SiO2 particles on substrates (nitride and silicon) is investigated and the surface density of deposited particles is found to be proportional to the volume particle concentration in the contamination solution. The particle surface density is estimated based on this proportionality. When the particle density on the surface is very big, the light point defect (LPD) signal measured by light scattering instruments does not increase with the particle density deposited. On the contrary, the haze increases proportionally to the particle density deposited on the surface. A model is developed to describe the added haze as a function of the particle size, the particle density on the surface and the refractive index of the particle material. This allows to determine the particle density for sizes smaller than the LPD size limit of the current state-of-the-art light scattering instruments.
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:TTO Association
Molecular Design and Synthesis
× corresponding author
# (joint) last author

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