Title: GeSn Technology: Impact of Sn on Ge CMOS Applications
Authors: Zaima, S
Nakatsuka, O
Shimura, Y
Adachi, M
Nakamura, M
Takeuchi, S
Vincent, Benjamin
Gencarelli, Federica
Clarysse, Trudo
Demeulemeester, J
Temst, K
Vantomme, Andre
Caymax, Matty
Loo, Roger
Issue Date: 2011
Host Document: ULSI Process Integration 7 vol:41 issue:7 pages:231-238
Conference: 7th Symposium on ULSI Process Integration at the 220th Meeting of the Electrochemical-Society (ECS) location:Boston, MA USA date:09-14 October 2011
ISBN: 978-1-60768-261-5
ISSN: 1938-5862
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Structural Composites and Alloys, Integrity and Nondestructive Testing

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science