Title: Mask absorber roughness impact in extreme ultraviolet lithography
Authors: Vaglio Pret, Alessandro ×
Gronheid, Roel
Graves, Trey
Smith, Mark D
Biafore, John #
Issue Date: Apr-2011
Publisher: SPIE - International Society for Optical Engineering
Series Title: Journal of Micro/Nanolithography, MEMS, and MOEMS vol:10 issue:2 pages:23012
ISSN: 1932-5150
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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