ITEM METADATA RECORD
Title: Heterogeneous integration and fabrication of III-V MOS devices in a 200mm processing environment
Authors: Waldron, Niamh
Nguyen, Duy
Lin, Dennis
Brammertz, Guy
Vincent, Benjamin
Firrincieli, Andrea
Winderickx, Gillis
Sioncke, Sonja
De Jaeger, Brice
Wang, Gang
Mitard, Jerome
Wang, Wei-E
Heyns, Marc
Caymax, Matty
Meuris, Marc
Absil, Philippe
Hoffmann, Thomas Y
Issue Date: 2011
Publisher: Electrochemical Society, Inc
Host Document: Electrochemical Society Transactions - ECS Transactions vol:35 issue:3 pages:299-309
Conference: Dielectrics in Nanosystems -and- Graphene, Ge/III-V, Nanowires and Emerging Materials for Post-CMOS Applications 3 location:Montreal Canada date:02-04 May 2011
ISBN: 978-1-60768-214-1
ISSN: 1938-5862
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Department of Materials Engineering - miscellaneous
Electrical Engineering - miscellaneous

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science