Title: Mask line roughness contribution in EUV lithography
Authors: Vaglio Pret, Alessandro ×
Gronheid, Roel #
Issue Date: Aug-2011
Publisher: North-Holland
Series Title: Microelectronic Engineering vol:88 issue:8 pages:2167-2170
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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