Title: Texture characterization of Cu interconnects with different Ta-based sidewall diffusion barriers
Authors: Wilson, Chris ×
Zhao, Chao
Volders, Henny
Zhao, Larry
Croes, Kristof
Tokei, Zsolt
Beyer, Gerald #
Issue Date: May-2011
Publisher: North-Holland
Series Title: Microelectronic Engineering vol:88 issue:5 pages:656-660
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Non-KU Leuven Association publications
× corresponding author
# (joint) last author

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