Title: Spatially separated atomic layer deposition of Al2O3, a new option for high-throughput Si solar cell passivation
Authors: Vermang, Bart ×
Rothschild, Aude
John, Joachim
Poortmans, Jozef
Mertens, Robert Pierre
Poodt, P.
Tiba, V.
Roozeboom, F. #
Issue Date: Sep-2011
Publisher: John Wiley & Sons, Ltd.
Series Title: Progress in Photovoltaics vol:19 issue:6 pages:733-739
ISSN: 1062-7995
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
ESAT - ELECTA, Electrical Energy Computer Architectures
Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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