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Title: The etching mechanisms of sio2 in hydrofluoric-acid
Authors: Verhaverbeke, S ×
Teerlinck, I
Vinckier, Christiaan
Stevens, G
Cartuyvels, R
Heyns, Mm #
Issue Date: Jan-1994
Publisher: Electrochemical soc inc
Series Title: Journal of the electrochemical society vol:141 issue:10 pages:2852-2857
Abstract: The different equilibria in HF and HF/HCl solutions are examined and the etching reaction of SiO2 is investigated as a function of the different species present in the HF solution. A new model for the etching mechanism of SiO2 is developed based on the existence of the dimer of HF, (HF)2.
URI: 
ISSN: 0013-4651
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
× corresponding author
# (joint) last author

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