Title: A novel environmentally-friendly corrosion-free post-stripping rinsing procedure after solvent strip
Authors: Vos, R
Rotondaro, A
Mertens, PW
Meuris, M
Heyns, Marc
Issue Date: 1997
Publisher: Japan society applied physics
Host Document: 1997 Symposium on VLSI Technology pages:37-38
Conference: 1997 Symposium on VLSI Technology location:Kyoto, Japan date:10-12 June 1997
Abstract: Corrosion of metal lines during the past-stripping rinse is a severe problem in multi-level metallization processes. In this paper it is demonstrated that the addition of small amounts of the inorganic acid HNO3 to the ultrapure water used for rinsing can effectively be used to suppress this corrosion without the need of an additional IPA-step.
ISBN: 4-930813-75-1
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Department of Materials Engineering - miscellaneous
Surface and Interface Engineered Materials

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