Title: Gas stream analysis and PFC recovery in a semiconductor process
Authors: VanHoeymissen, JAB
Daniels, M
Anderson, N
Fyen, Wim
Heyns, Marc #
Issue Date: 1997
Publisher: Materials Research Society
Host Document: Environmental, Safety, and Health Issues in IC Production vol:447 pages:55-60
Series Title: Materials Research Society Conference Proceedings
Conference: Symposium on Environmental, Safety, and Health Issues in IC Production location:Boston, MA, USA date:4-5 December 1996
Abstract: The performance of pressure swing adsorption (PSA) technology was assessed for recovering PFCs from the exhaust of a semiconductor plasma process. Several PSA process conditions were run to determine an optimized system. Under well defined conditions, the PSA technique was found to be effective at separating C2F6 from nitrogen, although the balance between recovery and product purity was evident. The exhaust of a plasma chamber was analysed by mass spectrometers and plasma etching conditions were varied to determine the effects on the PSA performance. A gas reactor column (GRC) was tested as pre-treatment of the capturing system.
ISBN: 1-55899-351-7
ISSN: 0886-7860
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Department of Materials Engineering - miscellaneous
# (joint) last author

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