International Symposium on Rapid Thermal and Other Short-Time Processing Technologies III, Date: 2002/05/13 - 2002/05/16, Location: Philadelphia, PA, USA

Publication date: 2002-01-01
Volume: 2002 Pages: 153 - 160
ISSN: 1-56677-334-2
Publisher: Electrochemical society inc; 65 S MAIN ST, PENNINGTON, NJ 08534-2839 USA

Proceedings Rapid Thermal and Other Short-time Processing Technologies III

Author:

De Witte, H
Passefort, S ; Besling, W ; Maes, JH ; Eason, K ; Young, E ; Heyns, Marc ; Timans, P ; Gusev, E ; Roozeboom, F ; Ozturk, MC ; Kwong, DL

Keywords:

oxides, Science & Technology, Physical Sciences, Thermodynamics, Electrochemistry, Physics, Condensed Matter, Physics

Abstract:

The use of the KLA Tencor Quantox in-line electrical metrology tool for evaluation and characterization of Atomic Layer Chemical Vapor Deposition ALCVD(TM) high k dielectrics has been investigated. Equivalent Oxide Thickness obtained from Quantox agrees very well with High Frequency Capacitance - Voltage, C-V, results. Also the Quantox ACTIV(TM) Index parameter shows nice correlation with CV J(gate). Therefore Quantox can be used as fast and much less expensive evaluation tool for optimization of ALCVD(TM) process conditions and process stability monitoring.