Title: Growth characteristics of MoS2 coatings prepared by unbalanced bipolar DC magnetron sputtering
Authors: Wang, JH ×
Xia, Y
Wieers, E
Stals, LM
Celis, Jean-Pierre #
Issue Date: Dec-2005
Publisher: Editorial Office of Trans. NFsoc., Central-South University of Technology
Series Title: Transactions of Nonferrous Metals Society of China vol:15 issue:6 pages:1214-1218
Abstract: MoS2 coatings were prepared by unbalanced bipolar DC magnetron sputtering under different argon pressures and for different deposition times, and the structure and morphology of MoS2 coatings were determined and observed respectively by X-ray diffractometry and scanning electron microscopy. The results show that at lower argon pressures of 0.15 Pa and 0.40 Pa, MoS2 coatings are formed with the (002) basal plane parallel to the surface, whereas the coating deposited at the argon pressure above 0.60 Pa has the (002) basal plane perpendicular to the surface. Two stages can be classified for the formation of MoS2 coating. At the initial stage of coating formation, the (002) basal plane with S-Mo-S layer structure grows on the substrate whatever the argon pressure is. And then the coating under 0.40 Pa argon pressure still grows with (002) laminate structure, but the coatings under 0. 88 Pa and 1.60 Pa argon pressures turn to grow with the mixed basal and edge orientations. The morphology and structure of MoS2 coatings are highly related to their growth rate and the energy of sputtered particles.
ISSN: 1003-6326
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Chemical and Extractive Metallurgy Section (-)
× corresponding author
# (joint) last author

Files in This Item:
File Description Status SizeFormat
pub03614.pdfMain article Published 5173KbAdobe PDFView/Open Request a copy

These files are only available to some KU Leuven Association staff members


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science