ITEM METADATA RECORD
Title: Computer simulation of Fe-Al-Si system diffusion couples
Authors: Gao, Yi ×
Huang, Shuigen
Van der Biest, Omer #
Issue Date: Aug-2011
Publisher: Editorial Board of Journal of Materials Science and Technology
Series Title: Journal of Materials Science & Technology vol:27 issue:8 pages:729-734
Abstract: Diffusion couples, Fe-6.8 wt% Al-1.0 wt% Si/Fe and Fe-6.3 wt% Al-0.9 wt% Si/Fe were constructed and separately annealed at 1050 degrees C for 3 h and at 1000 degrees C for 64 h. The concentration profiles of Fe, Al and Si atoms in these couples were measured by electron probe micro-analysis (EPMA), while the diffusion behavior was also simulated by coupling thermodynamic and kinetic properties of Fe-Al-Si system. The simulation results were in good agreement with the measured concentration profiles showing the validity of dynamic parameters of Fe-Al-Si system. Calculation was made for Fe-7 wt% Al-1 wt% Si/Fe diffusion couples at 1000 degrees C with different diffusion time. Silicon uphill was found under the influence of aluminum.
ISSN: 1005-0302
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Physical Metallurgy and Materials Engineering Section (-)
Department of Materials Engineering - miscellaneous
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science