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Title: Characterization of silicon oxynitride films by grazing-emission X-ray fluorescence spectrometry
Authors: Monaghan, ML ×
Nigam, T
Houssa, Michel
De Gendt, Stefan
Urbach, HP
de Bokx, PK #
Issue Date: Jan-2000
Publisher: Elsevier science sa
Series Title: Thin Solid Films vol:359 issue:2 pages:197-202
Abstract: Silicon oxynitride films, prepared by post-annealing of pre-oxidized silicon wafers in nitric oxide (NO), were characterized by grazing-emission X-ray fluorescence spectrometry (GEXRF). GEXRF is a new method of instrumental analysis that not only allows determination of the film composition, but also provides information on depth distributions and densities of films. Experiments were carried out using a prototype laboratory GEXRF instrument.
URI: 
ISSN: 0040-6090
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Semiconductor Physics Section
Molecular Design and Synthesis
× corresponding author
# (joint) last author

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