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Title: Sensitive light-scattering as a semiquantitative method for studying photoresist stripping
Authors: Rotondaro, Alp ×
Meuris, M
Schmidt, Hf
Heyns, Mm
Claeys, Cor
Hellemans, Louis
Snauwaert, Johan #
Issue Date: Jan-1995
Publisher: Electrochemical soc inc
Series Title: Journal of the electrochemical society vol:142 issue:1 pages:211-216
Abstract: Sensitive light scattering measurements are used to quantify the amount of residues after photoresist stripping on different substrates. The high sensitivity of this technique provides unique information regarding the efficiency of several stripping procedures by identifying photoresist traces that could not be easily detected by other methods. The proposed procedure permits the optimization of photoresist contamination removal steps like dry and wet stripping on a quantitative basis.
ISSN: 0013-4651
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Chemistry - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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